Nanometer-Scale Planar Holding In The Wafer Holding And Transporting Vacuum Chuck Market
The execution of high-resolution photolithography, wafer thinning, chemical mechanical planarization (CMP), and advanced optical metrology requires silicon and compound semiconductor wafers to be held with absolute mechanical stability and surface planarity. Even sub-micron surface height variations or localized substrate warpage can cause lithographic depth-of-focus errors, uneven material...
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